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Metal Heater

Metal Heater

High thermal conductivity
Metal heaters, with their excellent thermal conductivity, achieve fast heating and efficient heat transfer in semiconductor manufacturing, thereby improving process speed and efficiency.
Stability at high temperatures
It operates reliably at high temperatures and makes it suitable for reliable high-temperature processes.
Available in a wide selection of metals
Various metal selections allow you to choose materials optimized for specific applications.
High Strength and Durability
Metal has high strength and durability, allowing it to withstand mechanical shocks and long-term use.
Chemical stability
Al2O3, YAG, and AlF3 coatings are applied using Anodizing, PVD, and ALD technologies to maintain chemical stability in various semiconductor manufacturing environments.
  • Specification
    Size 200, 300mm(Wafer Size)
    Temperature uniformity <±1%
    Power 220V, 50/60Hz
    Max. Using Temp. 450℃
    Heating Area 1~4 zone
    Surface Treatment Electropolishing, Bead Blasting
    Anodizing, Ceramic Coating,
    AlF3 Coat, Bead Blasting, PVD, ALD
    Function Heating, RF Electrod, Vacuum chucking,
    ESC Chucking
    Welding Process TIG, FSW, P Type(By TTS) Welding,
    Diffusion Bonding
  • Supply process and equipment
    DxZ CENTURA
    WxZ CENTURA
    TxZ ENDURA
    PEDESTAL VECTOR
    PEDESTAL ALTUS
    HEATER ASM CVD/ALD
Metal Heater
Metal Heater
info
High thermal conductivity
Metal heaters, with their excellent thermal conductivity, achieve fast heating and efficient heat transfer in semiconductor manufacturing, thereby improving process speed and efficiency.
Stability at high temperatures
It operates reliably at high temperatures and makes it suitable for reliable high-temperature processes.
Available in a wide selection of metals
Various metal selections allow you to choose materials optimized for specific applications.
High Strength and Durability
Metal has high strength and durability, allowing it to withstand mechanical shocks and long-term use.
Chemical stability
Al2O3, YAG, and AlF3 coatings are applied using Anodizing, PVD, and ALD technologies to maintain chemical stability in various semiconductor manufacturing environments.
  • Specification
    Size 200, 300mm(Wafer Size)
    Temperature uniformity <±1%
    Power 220V, 50/60Hz
    Max. Using Temp. 450℃
    Heating Area 1~4 zone
    Surface Treatment Electropolishing, Bead Blasting
    Anodizing, Ceramic Coating,
    AlF3 Coat, Bead Blasting, PVD, ALD
    Function Heating, RF Electrod, Vacuum chucking,
    ESC Chucking
    Welding Process TIG, FSW, P Type(By TTS) Welding,
    Diffusion Bonding
  • Supply process and equipment
    DxZ CENTURA
    WxZ CENTURA
    TxZ ENDURA
    PEDESTAL VECTOR
    PEDESTAL ALTUS
    HEATER ASM CVD/ALD
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